Annealsys manufactures Rapid Thermal Processing and Chemical Vapor Deposition equipment for R&D and production applications. RTP / RTPCVD systems for wafers up to 200 mm. Cold wall chamber, vacuum capability and high temperature are the main features. Applications: contact annealing, oxidation, CVD of graphene and hBN, selenization and silicon carbide implant annealing. DLI-CVD / DLI-ALD systems up to 200 mm with direct liquid injection (DLI) vaporizers for deposition of metals, oxides, nitrides, carbon nanotubes and III-V materials. Multi process capability 2-inch system: DLI-CVD, DLI-ALD, MOCVD and RTP inside the same chamber.